Keywords
Aluminium
RF sputtering
How to Cite
Abstract
Aluminum (Al) thin films are of great interest for applications in telecommunications, microelectronics, and the automotive industry, among others, due to their high conductivity, excellent optical properties and low weight. Their properties depend on the depositition technique and its parameters. In this work, the crystallographic, morphological, and optical characteristics of Al thin films grown by radio-frequency (RF) magnetron sputtering were analyzed. An aluminum target was used in an argon (Ar) atmosphere, and the effect of sputtering power on film properties was investigated. The samples were characterized by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and UV-Vis Spectroscopy. The crystalline quality improved with increasing power. AFM and SEM results revealed an increase in roughness, thickness, and grain size with higher sputtering power. UV-Vis spectroscopy showed lower diffuse reflectance at lower power across the 190-900 nm range. The enhancement of film properties is mostly attributed to the increased kinetic energy of sputtered species, directly related to the applied RF power.
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